Nanoscale optical nonreciprocity with nonlinear metasurfaces
2024年6月13日 · Nonlinear nonreciprocity is self-induced, and therefore it can be implemented in fully passive optical systems. Nonlinear nonreciprocal components do not require any external biases, thus being...
As Dammel points out5, surface inhibition in a pure novolac resin is not well-understood, while there are several known mechanisms for surface inhibition in photoresists. For example, T-topping is observed in chemically amplified resists due to environmental base contamination.
Sensitive Photoresists for Rapid Multiphoton 3D Laser Micro‐ and ...
2020年8月26日 · Aiming at ever faster 3D printing, there exist two options: Using yet more powerful lasers or searching for more sensitive photoresists allowing for higher speeds at comparable or lower power levels. Here, altogether more than 70 different photoresists from the literature and a few new candidates are reviewed with regard to effective ...
High-resolution two-photon polymerization: the most versatile …
2021年9月3日 · The polymerization is started by two-photon absorption (TPA) triggered by a focused laser pulse, which provides a nonlinear energy distribution centered at the laser’s focal point applied to the...
An easy method to improve efficiency of multi-photon …
2022年7月1日 · In this work, organic solvents with nonlinear optical absorption are employed to facilitate MPP in photoresists via enhancing the multi-photon absorption (MPA) of photo-initiator (PI). The nonlinear absorption (NLA) performance is characterized by the Z-Scan technique, and the verification of MPP is carried out using a single-pulse and long ...
The Characterization of Absorptive Nonlinearities
2017年8月29日 · Both of these techniques can provide reliable and accurate measurements of the order of effective nonlinear absorption in multiphoton photoresists, which in principle may involve a combination of multi- and single-photon absorption steps that drive population to the state from which chemistry takes place.
As the fundamental limits of optical lithography are ap- proached, the nonlinear optical properties of the photoresist become increasingly important. This nonlinearity arises from the change in the complex index of refraction of the photo- resist under UV exposure.
Nonlinear optical properties of photoresists for projection …
1996年1月22日 · This nonlinear optical phenomenon is apparent only for low average optical intensities and produces index of refraction changes as large as 0.04. We propose using the self‐focusing and self‐trapping phenomenon in projection photolithography to enhance the resolution and depth of focus.
Ultrahigh-printing-speed photoresists for additive manufacturing
2023年10月2日 · Here we show an extremely sensitive zirconium oxide hybrid- (2,4-bis (trichloromethyl)-6- (4-methoxystyryl)-1,3,5-triazine) (ZrO 2 -BTMST) photoresist system that can achieve a printing speed of...
[PDF] Nonlinear optical properties of photoresists for projection ...
1996年1月22日 · This nonlinear optical phenomenon is apparent only for low average optical intensities and produces index of refraction changes as large as 0.04. We propose using the self‐focusing and self‐trapping phenomenon in projection photolithography to enhance the resolution and depth of focus.