Each low-numerical aperture (NA) extreme ultraviolet (EUV) lithography system costs over US$100 million, making it one of the most expensive semiconductor manufacturing tools in history.

Abstract: The introduction of the shaped-beam imaging technique has greatly enhanced the exposure efficiency of electron-beam lithography systems. IBM's EL systems provide the throughput needed for ...

A panel of semiconductor photomask and lithography experts debated these survey results and more ... Then there’s the classic problem multi-beam mask writers solve – run away write times on variable ...

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