In some applications, however, a reactive gas is purposely added to argon so that the deposited film is a chemical compound, and not the elemental target materials. Sputter deposition normally occurs ...

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Sputtering is a deposition process in which a plasma is used to ablate material from a metal or dielectric target. The ablated material redeposits onto the substrate. Sputtering is a more flexible ...

Researchers in China have fabricated a perovskite-silicon tandem solar cell that utilizes an indium oxide sputtering buffer ...